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Sample-morphology effects on x-ray photoelectron peak intensities
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10.1116/1.4774214
/content/avs/journal/jvsta/31/2/10.1116/1.4774214
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/2/10.1116/1.4774214

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagrams of the specimen morphologies for which SESSA simulations were made. The left side indicates the Cu/Au morphologies and the right side the SiO2/Si morphologies. The hatched regions indicate the sources of the signal photoelectrons, Cu 2p3/2 photoelectrons for the Cu/Au morphologies and O 1s photoelectrons for the SiO2/Si morphologies.

Image of FIG. 2.
FIG. 2.

(Color online) Intrinsic (a) Cu 2p and (b) O 1s spectra obtained by Tougaard (Ref. 22 ) that were used in the SESSA simulations.

Image of FIG. 3.
FIG. 3.

(Color online) Simulated Cu 2p spectra for the Cu/Au morphologies of Fig. 1 for photoelectron emission angle α = 0° with (a) elastic scattering switched on and (b) elastic scattering switched off. The legend indicates the film thicknesses found to give the same Cu 2p3/2 peak intensities, as described in the text.

Image of FIG. 4.
FIG. 4.

(Color online) Same as Fig. 3 except with α = 65°.

Image of FIG. 5.
FIG. 5.

(Color online) Simulated O 1s spectra for the SiO2/Si morphologies of Fig. 1 for photoelectron emission angle α = 0° with (a) elastic scattering switched on and (b) elastic scattering switched off. The legend indicates the film thicknesses found to give the same O 1s peak intensities, as described in the text.

Image of FIG. 6.
FIG. 6.

(Color online) Same as Fig. 5 except with α = 65°.

Image of FIG. 7.
FIG. 7.

(Color online) Plots of the ratios, R, of film thicknesses found with elastic scattering switched on [given in the legends of Figs. 3(a) , 4(a) , 5(a) , and 6(a) ] to the corresponding thicknesses found with elastic scattering switched off [given in the legends of Figs. 3(b) , 4(b) , 5(b) , and 6(b) ] as a function of the single-scattering albedo, ω, for photoelectron emission angle α = 0° (●) and α = 65° (▪). The error bars for R represent one-standard-deviation uncertainties based on the uncertainties in determining the film thicknesses shown in the legends of Figs. 3–6 . (a) Morphologies (c) and (d) of Fig. 1 and (b) morphologies (a) and (b) of Fig. 1 . The positions of the points for α = 65° have been shifted horizontally to avoid overlaps with the points for α = 0°. The dashed line in Fig. 7(b) is a plot of R EAL from Eq. (4) .

Tables

Generic image for table
TABLE I.

Values of IMFPs, TMFPs, and the single-scattering albedo, ω, for the indicated materials and electron energies.

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/content/avs/journal/jvsta/31/2/10.1116/1.4774214
2013-01-08
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Sample-morphology effects on x-ray photoelectron peak intensities
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/2/10.1116/1.4774214
10.1116/1.4774214
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