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Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide
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10.1116/1.4780122
/content/avs/journal/jvsta/31/2/10.1116/1.4780122
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/2/10.1116/1.4780122
/content/avs/journal/jvsta/31/2/10.1116/1.4780122
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/content/avs/journal/jvsta/31/2/10.1116/1.4780122
2013-01-28
2014-08-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/2/10.1116/1.4780122
10.1116/1.4780122
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