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Real-time control of electron density in a capacitively coupled plasma
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10.1116/1.4795207
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    Affiliations:
    1 National Centre for Plasma Science and Technology (NCPST), Research and Engineering Building, Dublin City University, Glasnevin, Dublin 9, Ireland and School of Physical Sciences, Dublin City University, Glasnevin, Dublin 9, Ireland
    2 National Centre for Plasma Science and Technology (NCPST), Research and Engineering Building, Dublin City University, Glasnevin, Dublin 9, Ireland and School of Electronic Engineering, Dublin City University, Glasnevin, Dublin 9, Ireland
    3 National Centre for Plasma Science and Technology (NCPST), Research and Engineering Building, Dublin City University, Glasnevin, Dublin 9, Ireland and School of Physical Sciences, Dublin City University, Glasnevin, Dublin 9, Ireland
    4 School of Electronic Engineering, Dublin City University, Glasnevin, Dublin 9, Ireland
    5 National Centre for Plasma Science and Technology (NCPST), Research and Engineering Building, Dublin City University, Glasnevin, Dublin 9, Ireland and School of Electronic Engineering, Dublin City University, Glasnevin, Dublin 9, Ireland
    6 National Centre for Plasma Science and Technology (NCPST), Research and Engineering Building, Dublin City University, Glasnevin, Dublin 9, Ireland and School of Physical Sciences, Dublin City University, Glasnevin, Dublin 9, Ireland
    a) Electronic mail: bernard.keville@dcu.ie
    J. Vac. Sci. Technol. A 31, 031302 (2013); http://dx.doi.org/10.1116/1.4795207
/content/avs/journal/jvsta/31/3/10.1116/1.4795207
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/3/10.1116/1.4795207
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Open loop, RIE schematic.

Image of FIG. 2.
FIG. 2.

(Color online) Open loop measurement of plasma density in an argon plasma.

Image of FIG. 3.
FIG. 3.

(Color online) Open loop OES measurements in an plasma.

Image of FIG. 4.
FIG. 4.

Mini-lab RIE 80 schematic. (1) Grounded top electrode, (2) powered lower electrode, (3) dark space shield, (4) base plate, (5) shower head gas inlet, and (6) top viewport.

Image of FIG. 5.
FIG. 5.

(Color online) Real-time plasma process control configuration.

Image of FIG. 6.
FIG. 6.

(Color online) Plasma chamber and hairpin probe setup.

Image of FIG. 7.
FIG. 7.

(Color online) Real-time acquisition of electron density via LabVIEW program.

Image of FIG. 8.
FIG. 8.

(Color online) Electron density as a function of RF power and pressure.

Image of FIG. 9.
FIG. 9.

(Color online) Electron density step response.

Image of FIG. 10.
FIG. 10.

(Color online) Normalized responses of pressure and electron density to a step in argon flow rate.

Image of FIG. 11.
FIG. 11.

(Color online) Control loop schematic.

Image of FIG. 12.
FIG. 12.

(Color online) Deadbeat control : Set point tracking.

Image of FIG. 13.
FIG. 13.

(Color online) Deadbeat control : Disturbance rejection.

Image of FIG. 14.
FIG. 14.

(Color online) Set point tracking for .

Image of FIG. 15.
FIG. 15.

(Color online) for a step disturbance as a function of p 0.

Image of FIG. 16.
FIG. 16.

(Color online) Open loop response of electron density to a leak of helium into the chamber.

Image of FIG. 17.
FIG. 17.

(Color online) Closed loop response of electron density to a leak of helium into the chamber.

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/content/avs/journal/jvsta/31/3/10.1116/1.4795207
2013-03-22
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Real-time control of electron density in a capacitively coupled plasma
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/3/10.1116/1.4795207
10.1116/1.4795207
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