X-ray diffractograms of films grown from Mn[N(t-Bu)2]2 and NH3 at 80 °C (bottom), 200 °C (middle), and 300 °C (top). The η-Mn3N2, Mn2N1.08, and Mn23C6 reflections are indicated.
Bright-field TEM of a 50 nm-thick Mn3N2−x film grown at 100 °C with 5.0 sccm of ammonia. Insets: nanodiffraction patterns from areas 1 and 2 as indicated.
Bright-field TEM of a 190 nm-thick η-Mn3N2−x film grown at 200 °C with 5.0 sccm of NH3. The inset shows a typical multigrain diffraction pattern from the film, indicating polycrystalline η-Mn3N2.
(Color online) (a) 89 nm-thick film of η-Mn3N2 grown at 80 °C. (b) 73 nm-thick film of η-Mn3N2−x grown at 200 °C. (c) AFM micrographs of a 95 nm-thick η-Mn3N2−x film grown at 200 °C and 5.0 sccm ammonia flow, as deposited. The RMS roughness is 2.3 nm. (d) 185 nm-thick mixed-phase film of η-Mn3N2, ζ-phase Mn2N1.08, and cubic Mn23C6 grown at 300 °C.
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