Schematic of the two dimensional model of the plasma source investigated in this study. Model slot placements are indicated as slots 1 and 2.
Impact of reduced magnetic and electric fields (141–1410 Td) on total collision frequency from Nakamura and co-workers (Ref. 9 ).
Collision frequency as a function of electron temperature for different pressures from 20 mTorr to 2 Torr compared to electron cyclotron frequencies at 1 and 5 Gauss.
Illustration of the conversion of the magnetic field components from the frame of the imposed field to the lab frame.
Electric field under the circumstance of no magnetic field for (a) slot 1 and (b) slot 2 and (c) electron density profiles at 5 mm above the wafer without magnetic field resulting from one slot without the other.
Profiles of normalized magnetic fields. (a) Axially directed magnetic field normalized to their maximum value, where (a′) and (b′) . (b) Radially directed magnetic fields normalized to their maximum values, where (a″) , (b″) , (c″) , z = 0 at the surface of top window.
Electron density and electron temperature field plots: (a) No magnetic field; (b) B = 10 (G) ( ) in the axial direction, and (c) B = 10 (G) ( ) in the radial direction.
Electron density profiles at 5 mm above the wafer with axially directed magnetic fields: (a) with slot 1; (b) with slot 1; (c) with slot 2; and (d) with slot 2.
Controllability parameter, , for the case of an axially directed magnetic field: (a) with slot 1; (b) with slot 1; (c) with slot 2; and (d) with slot 2.
Electron density profiles at 5 mm above the wafer with radially directed magnetic fields: (a) with slot 1; (b) with slot 1; (c) with slot 1; (d) with slot 2; (e) with slot 2; and (f) with slot 2.
Controllability parameter, , for the case of radially directed magnetic fields: (a) slot 1 where (a′) , (b′) , and (c′) . (b) Slot 2 where (a″) , (b″) , and (c″) .
Electron density profiles for magnetic field “on” and magnetic field “off” states and for the case of a magnetic field duty cycle of 70%.
Electron density profiles with and without ECR effect considered in the simulation.
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