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Impact of static magnetic fields on the radial line slot antenna plasma source
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10.1116/1.4802737
/content/avs/journal/jvsta/31/3/10.1116/1.4802737
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/3/10.1116/1.4802737
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic of the two dimensional model of the plasma source investigated in this study. Model slot placements are indicated as slots 1 and 2.

Image of FIG. 2.
FIG. 2.

Ionization rate coefficient for three different driving frequencies. The rates are calculated using BOLSIG+ (Ref. 18 ), and the model collision frequency is based on Meeks work (Ref. 19 ).

Image of FIG. 3.
FIG. 3.

Impact of reduced magnetic and electric fields (141–1410 Td) on total collision frequency from Nakamura and co-workers (Ref. 9 ).

Image of FIG. 4.
FIG. 4.

Collision frequency as a function of electron temperature for different pressures from 20 mTorr to 2 Torr compared to electron cyclotron frequencies at 1 and 5 Gauss.

Image of FIG. 5.
FIG. 5.

Illustration of the conversion of the magnetic field components from the frame of the imposed field to the lab frame.

Image of FIG. 6.
FIG. 6.

Electric field under the circumstance of no magnetic field for (a) slot 1 and (b) slot 2 and (c) electron density profiles at 5 mm above the wafer without magnetic field resulting from one slot without the other.

Image of FIG. 7.
FIG. 7.

Profiles of normalized magnetic fields. (a) Axially directed magnetic field normalized to their maximum value, where (a′) and (b′) . (b) Radially directed magnetic fields normalized to their maximum values, where (a″) , (b″) , (c″) , z = 0 at the surface of top window.

Image of FIG. 8.
FIG. 8.

Electron density and electron temperature field plots: (a) No magnetic field; (b) B = 10 (G) ( ) in the axial direction, and (c) B = 10 (G) ( ) in the radial direction.

Image of FIG. 9.
FIG. 9.

Electron density profiles at 5 mm above the wafer with axially directed magnetic fields: (a) with slot 1; (b) with slot 1; (c) with slot 2; and (d) with slot 2.

Image of FIG. 10.
FIG. 10.

Controllability parameter, , for the case of an axially directed magnetic field: (a) with slot 1; (b) with slot 1; (c) with slot 2; and (d) with slot 2.

Image of FIG. 11.
FIG. 11.

Electron density profiles at 5 mm above the wafer with radially directed magnetic fields: (a) with slot 1; (b) with slot 1; (c) with slot 1; (d) with slot 2; (e) with slot 2; and (f) with slot 2.

Image of FIG. 12.
FIG. 12.

Controllability parameter, , for the case of radially directed magnetic fields: (a) slot 1 where (a′) , (b′) , and (c′) . (b) Slot 2 where (a″) , (b″) , and (c″) .

Image of FIG. 13.
FIG. 13.

Electron density profiles for magnetic field “on” and magnetic field “off” states and for the case of a magnetic field duty cycle of 70%.

Image of FIG. 14.
FIG. 14.

Electron density profiles with and without ECR effect considered in the simulation.

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/content/avs/journal/jvsta/31/3/10.1116/1.4802737
2013-04-26
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Impact of static magnetic fields on the radial line slot antenna plasma source
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/3/10.1116/1.4802737
10.1116/1.4802737
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