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Roughness evolution during the atomic layer deposition of metal oxides
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10.1116/1.4812707
/content/avs/journal/jvsta/31/6/10.1116/1.4812707
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/6/10.1116/1.4812707
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) (a) Logarithms of the rms roughness σ and (b) the correlation length ξ for of atomic-layer deposited AlO as a function of the logarithm of the film thickness.

Image of FIG. 2.
FIG. 2.

(a) Logarithms of the rms roughness σ and (b) the correlation length for NiO as a function of the logarithm of the film thickness.

Image of FIG. 3.
FIG. 3.

(Color online) (a) Logarithms of the rms roughness σ and (b) the correlation length ξ for HfO as a function of the logarithm of the film thickness.

Image of FIG. 4.
FIG. 4.

(a) Specular and (b) nonspecular x-ray reflectance of an 8-period HfO/AlO multilayer. In (a), the solid line is a best fit to the data using the structure described in the text.

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/content/avs/journal/jvsta/31/6/10.1116/1.4812707
2013-07-02
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Roughness evolution during the atomic layer deposition of metal oxides
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/6/10.1116/1.4812707
10.1116/1.4812707
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