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Microstructure and mechanical properties of Ti–B–C–N–Si nanocomposite films deposited by unbalanced magnetron sputtering
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10.1116/1.4815952
/content/avs/journal/jvsta/31/6/10.1116/1.4815952
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/6/10.1116/1.4815952

Figures

Image of FIG. 1.
FIG. 1.

(Color online) X-ray diffraction patterns of Ti–B–C–N–Si films deposited on AISI 304 stainless steel substrates with different silicon contents.

Image of FIG. 2.
FIG. 2.

(Color) XPS spectra of (a) Ti 2p, (b) B 1s, (c) C 1s, (d) N 1s, (e) Si 2p, and (f) O 1s for Ti–B–C–N–Si(5 at. %) film.

Image of FIG. 3.
FIG. 3.

(a) Bright field TEM image and (b) corresponding SADP obtained from the Ti–B–C–N–Si(5 at. %) film sample.

Image of FIG. 4.
FIG. 4.

(Color online) (a) High resolution TEM image obtained from Ti–B–C–N–Si(5 at. %) film and (b) corresponding IFFT image calculated by Micrograph Gartan software.

Image of FIG. 5.
FIG. 5.

(Color online) Three-dimensional AFM surface morphologies and their surface roughness of (a) Ti–B–C–N and (b) Ti–B–C–N–Si(5 at. %) film deposited on silicon wafer substrate.

Image of FIG. 6.
FIG. 6.

(Color) Schematic illustration of Ti–B–C–N–Si [nc–(Ti,C,N)B/nc-Ti(C,N)/nc-TiSi/a–BN/a–SiO/a–BO/a–TiO/a–SiC/etc.] nanocomposite based on XRD, XPS, TEM, and AFM analyses.

Image of FIG. 7.
FIG. 7.

(Color online) Nanohardness (H), Young's modulus (E), elastic recovery (W), H/E ratio, and residual stress of Ti–B–C–N–Si films with different content of silicon.

Tables

Generic image for table
TABLE I.

Typical deposition conditions of Ti–B–C–N–Si films deposited by the d.c. unbalanced magnetron sputtering.

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/content/avs/journal/jvsta/31/6/10.1116/1.4815952
2013-07-22
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Microstructure and mechanical properties of Ti–B–C–N–Si nanocomposite films deposited by unbalanced magnetron sputtering
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/6/10.1116/1.4815952
10.1116/1.4815952
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