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Nanoscale compositional analysis of NiTi shape memory alloy films deposited by DC magnetron sputtering
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10.1116/1.4816841
/content/avs/journal/jvsta/31/6/10.1116/1.4816841
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/6/10.1116/1.4816841
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Figures

Image of FIG. 1.
FIG. 1.

(Color online) TOF-SIMS sputter depth profile of NiTi thin film deposited at substrate temperature of 300 °C in as-deposited condition (a) over all profile (inset zoomed view of the film substrate interface) and (b) zoomed view of the top surface.

Image of FIG. 2.
FIG. 2.

(Color online) TOF-SIMS sputter depth profile of a NiTi thin film deposited at 300 °C postannealed to 600 °C, (a) over all profile (inset—zoomed view of the film substrate interface) and (b) zoomed view of the top surface.

Image of FIG. 3.
FIG. 3.

XPS survey spectra of NiTi thin film deposited at 300 °C: (a) in as deposited condition and (b) postannealed at 600 °C for 4 h.

Image of FIG. 4.
FIG. 4.

(Color online) XPS high resolution spectra recorded for (a) Ti(2p) and (b) O(1s) with deconvolution plots.

Image of FIG. 5.
FIG. 5.

XTEM images recorded for as deposited film (a) Bright field TEM image near the top surface of the film and (b) SAEDP obtained near the top surface of the film.

Image of FIG. 6.
FIG. 6.

XTEM results of the film deposited at 300 °C and postannealed at 600 °C; (a) Bright-field image of the film section near the top surface (inset shows the SAEDP image recorded from the NiTi film section) and (b) SAEDP image recorded for the intermediate layer near the top surface.

Image of FIG. 7.
FIG. 7.

(Color online) STEM-EDS line average atomic percent of composition profiles for Ni, Ti, O, and Si showing the concentration variation of the respective elements across the film thickness for NiTi film deposited at 300 °C and postannealed at 600 °C in high vacuum for 4 h.

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/content/avs/journal/jvsta/31/6/10.1116/1.4816841
2013-07-29
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nanoscale compositional analysis of NiTi shape memory alloy films deposited by DC magnetron sputtering
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/6/10.1116/1.4816841
10.1116/1.4816841
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