Schematic representation of the two-step NaSS grafting procedure: step 1—surface immobilization of the ATRP initiator via ClSi functionalization of the substrate; step 2—ATRP grafting of NaSS.
XPS compositions for a preliminary time-dependent study. Reactions were performed solely on Ti substrates under identical conditions to those described in the experimental section, except that a 50/50 ratio was used. Compositions are reported as the avg stdev of three spots on two samples.
XPS high resolution spectra of the ClSi (a) and NaSS (b) films on Ti; XPS high resolution spectra of the ClSi (c) and NaSS (d) films on Si; XPS high resolution spectra of the NaSS film on Ti (e) and Si (f).
ToF-SIMS PCA loadings plots with inset scores plots for negative (a) and positive (b) secondary ion spectra. (♦) and (▲) designate NaSS on Ti and Si, respectively; (▪) and (●) designate ClSi and Ti and Si, respectively. Open symbols designate measurements on replicate samples. (*) designate the 95% confidence intervals.
(Color online) 500 × 500 μm2 ToF-SIMS images of the signal on ClSi functionalized Ti (a) and Si (b) substrates, and the sum of fragments on NaSS grafted Ti (c) and Si (d) substrates.
(Color online) Ellipsometry thickness maps for the ClSi-functionalized Si (a) and Ti (b) substrates, and for NaSS-grafted Si (c) and Ti (d) substrates.
(Color online) 1 × 1 μm2 AFM images of bare Si (a) and Ti (d) substrates, ClSi-functionalized Si (b) and Ti (e) substrates, and NaSS grafted Si (c) and Ti (f) substrates.
XPS determined elemental compositions of bare, ClSi-modified, and pNaSS-grafted Ti and Si substrates. AFM RMS roughness values for each sample are also listed. All composition and roughness values are reported as the avg stdev of three spots on two samples.
Ellipsometry and AFM determined ClSi and pNaSS film thicknesses (nm). SE mapping thicknesses are reported as the avg stdev of the 25 spots measured across each sample (see Fig. 6 ). Scratch test thicknesses are reported as the avg stdev of three spots across each sample. Replicate number refers to the fact that two replicates of each substrate were prepared and analyzed after each treatment.
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