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Effect of trimethylsilane pressure on hot-wire chemical vapor deposition chemistry using vacuum ultraviolet laser ionization mass spectrometry
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10.1116/1.4825105
/content/avs/journal/jvsta/31/6/10.1116/1.4825105
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/6/10.1116/1.4825105
/content/avs/journal/jvsta/31/6/10.1116/1.4825105
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/content/avs/journal/jvsta/31/6/10.1116/1.4825105
2013-10-11
2014-09-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of trimethylsilane pressure on hot-wire chemical vapor deposition chemistry using vacuum ultraviolet laser ionization mass spectrometry
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/31/6/10.1116/1.4825105
10.1116/1.4825105
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