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Selective atomic layer deposition of zirconia on copper patterned silicon substrates using ethanol as oxygen source as well as copper reductant
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10.1116/1.4826941
/content/avs/journal/jvsta/32/1/10.1116/1.4826941
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/1/10.1116/1.4826941
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Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic illustration of processing steps proposed for the SALD of ZrO using ethanol as the oxygen source.

Image of FIG. 2.
FIG. 2.

(Color online) ZrO-ALD film thickness as a function of ALD cycle number showing excellent thickness tunability of the process on the silicon side of the substrate using ethanol as the oxygen source. The deposition was carried out at 200 °C substrate temperature and 500 mTorr deposition pressure using 6 s ZyALD:15 s Ar:10 s ethanol:20 s Ar pulses.

Image of FIG. 3.
FIG. 3.

(Color online) XPS spectra of the silicon side of the substrate after 0 (a), 50 (b), and 100 (c) ALD cycles. Upon 5 min of Ar+ beam sputtering, the C 1s peak disappeared (d). All deposition conditions are the same as those mentioned in Fig. 2 .

Image of FIG. 4.
FIG. 4.

(Color online) XPS spectra on copper side of the substrate after 0 (a), 70 (b), 100 (c), and 200 (d) ALD cycles, showing the onset of the ZrO-ALD film growth only after 100 or more ALD cycles. The ALD conditions are the same as those in Fig. 2 .

Image of FIG. 5.
FIG. 5.

(Color online) XPS survey scans on copper surface after 50 ZrO ALD cycles using water (a) and oxygen (b) as the ALD oxygen sources. All other ALD parameters are the same as those in Fig. 2 .

Image of FIG. 6.
FIG. 6.

(Color online) Change in sheet resistance ((R − R)/R) of copper layer in as-deposited (R) and annealed (R) Cu/2 nm-thick ZrO/Si structures. The annealing was carried out in 20 slpm of N for 5 min.

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/content/avs/journal/jvsta/32/1/10.1116/1.4826941
2013-10-28
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Selective atomic layer deposition of zirconia on copper patterned silicon substrates using ethanol as oxygen source as well as copper reductant
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/1/10.1116/1.4826941
10.1116/1.4826941
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