XRR patterns for the ZnO:AP thin films. The vertical axis is presented in logarithmic scale.
XRR patterns for the ZnO:ODA films. The vertical axis is presented in logarithmic scale.
FTIR spectra for the hybrid films with a 3:1 ZnO to organic (HQ, AP or ODA) layer ratio.
Room-temperature Seebeck coefficient values for the ZnO:organic hybrid films. Here, the organic layer content is presented as a percentage value of the total number of layers based on the ALD/MLD pulsing sequence, e.g., a ratio of 199:1 becomes 0.5%.
Room-temperature resistivity values for the ZnO:organic hybrid films. The organic layer content is presented as a percentage of the total number of layers in the pulsing sequence in the same way as in Fig. 4 .
Fitting parameters for fitting of the XRR patterns of the ZnO:organicthin films. The t1, t2, and t3 values in the ZnO column correspond to the thicknesses of the “blocks” of ZnO between the substrate and the first organic layer (t1), between two organic layers in the superlattice (t2), and on top of the last organic layer (t3). ρ in this table stands for density.
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