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Atomic layer deposition of bismuth oxide using Bi(OCMe2 iPr)3 and H2O
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10.1116/1.4840835
/content/avs/journal/jvsta/32/1/10.1116/1.4840835
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/1/10.1116/1.4840835
/content/avs/journal/jvsta/32/1/10.1116/1.4840835
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/content/avs/journal/jvsta/32/1/10.1116/1.4840835
2013-12-09
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Atomic layer deposition of bismuth oxide using Bi(OCMe2iPr)3 and H2O
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/1/10.1116/1.4840835
10.1116/1.4840835
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