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Volume 32, Issue 1 Front cover image - large version

Volume 32, Issue 1, January 2014

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FEATURED ARTICLE
  • Deposition temperature dependence of material and Si surface passivation properties of O<sub>3</sub>-based atomic layer deposited Al<sub>2</sub>O<sub>3</sub>-based films and stacks
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38d913362403a4a254fa758cb6527ba5 journal.issuezxybnytfddd
Scitation: Journal of Vacuum Science & Technology A - Volume 32, Issue 1
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/1
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