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Effects of magnetic flux density and substrate bias voltage on Ni films prepared on a flexible substrate material using unbalanced magnetron sputtering assisted by inductively coupled plasma
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10.1116/1.4832226
/content/avs/journal/jvsta/32/2/10.1116/1.4832226
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/2/10.1116/1.4832226
/content/avs/journal/jvsta/32/2/10.1116/1.4832226
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/content/avs/journal/jvsta/32/2/10.1116/1.4832226
2013-11-20
2014-08-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of magnetic flux density and substrate bias voltage on Ni films prepared on a flexible substrate material using unbalanced magnetron sputtering assisted by inductively coupled plasma
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/2/10.1116/1.4832226
10.1116/1.4832226
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