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Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma
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10.1116/1.4843575
/content/avs/journal/jvsta/32/2/10.1116/1.4843575
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/2/10.1116/1.4843575
/content/avs/journal/jvsta/32/2/10.1116/1.4843575
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/content/avs/journal/jvsta/32/2/10.1116/1.4843575
2013-12-12
2014-09-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/2/10.1116/1.4843575
10.1116/1.4843575
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