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Modeling of inductively coupled plasma SF6/O2/Ar plasma discharge: Effect of O2 on the plasma kinetic properties
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10.1116/1.4853675
/content/avs/journal/jvsta/32/2/10.1116/1.4853675
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/2/10.1116/1.4853675
/content/avs/journal/jvsta/32/2/10.1116/1.4853675
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/content/avs/journal/jvsta/32/2/10.1116/1.4853675
2013-12-26
2014-12-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Modeling of inductively coupled plasma SF6/O2/Ar plasma discharge: Effect of O2 on the plasma kinetic properties
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/2/10.1116/1.4853675
10.1116/1.4853675
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