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Process monitoring during AlNxOy deposition by reactive magnetron sputtering and correlation with the film's properties
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10.1116/1.4863957
/content/avs/journal/jvsta/32/2/10.1116/1.4863957
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/2/10.1116/1.4863957
/content/avs/journal/jvsta/32/2/10.1116/1.4863957
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/content/avs/journal/jvsta/32/2/10.1116/1.4863957
2014-02-04
2014-12-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Process monitoring during AlNxOy deposition by reactive magnetron sputtering and correlation with the film's properties
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/2/10.1116/1.4863957
10.1116/1.4863957
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