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Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
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10.1116/1.4868215
/content/avs/journal/jvsta/32/3/10.1116/1.4868215
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/3/10.1116/1.4868215
/content/avs/journal/jvsta/32/3/10.1116/1.4868215
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/content/avs/journal/jvsta/32/3/10.1116/1.4868215
2014-03-25
2014-12-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/32/3/10.1116/1.4868215
10.1116/1.4868215
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