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Scalable control program for multiprecursor flow-type atomic layer deposition system
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11.See supplementary material at http://dx.doi.org/10.1116/1.4893774 for the labview ALD control program.[Supplementary Material]
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/content/avs/journal/jvsta/33/1/10.1116/1.4893774
2014-08-28
2014-09-22

Abstract

The authors report the development and implementation of a scalable control program to control flow type atomic layer deposition (ALD) reactor with multiple precursor delivery lines. The program logic is written and tested in environment to control ALD reactor with four precursor delivery lines to deposit up to four layers of different materials in cyclic manner. The programming logic is conceived such that to facilitate scale up for depositing more layers with multiple precursors and scale down for using single layer with any one precursor in the ALD reactor. The program takes precursor and oxidizer exposure and purging times as input and controls the sequential opening and closing of the valves to facilitate the complex ALD process in cyclic manner. The program could be used to deposit materials from any single line or in tandem with other lines in any combination and in any sequence.

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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Scalable control program for multiprecursor flow-type atomic layer deposition system
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/33/1/10.1116/1.4893774
10.1116/1.4893774
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