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Infrared spectroscopic study of SiO x films produced by plasma enhanced chemical vapor deposition
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10.1116/1.573833
/content/avs/journal/jvsta/4/3/10.1116/1.573833
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/4/3/10.1116/1.573833
/content/avs/journal/jvsta/4/3/10.1116/1.573833
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/content/avs/journal/jvsta/4/3/10.1116/1.573833
1986-05-01
2014-07-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor deposition
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/4/3/10.1116/1.573833
10.1116/1.573833
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