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Etching of thin SiO2 layers using wet HF gas
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10.1116/1.576033
/content/avs/journal/jvsta/7/3/10.1116/1.576033
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/7/3/10.1116/1.576033
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/content/avs/journal/jvsta/7/3/10.1116/1.576033
1989-05-01
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Etching of thin SiO2 layers using wet HF gas
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/7/3/10.1116/1.576033
10.1116/1.576033
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