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The preparation of amorphous Si:H thin films for optoelectronic applications by glow discharge dissociation of SiH4 using a direct‐current saddle‐field plasma chamber
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10.1116/1.575765
/content/avs/journal/jvsta/7/4/10.1116/1.575765
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/7/4/10.1116/1.575765
/content/avs/journal/jvsta/7/4/10.1116/1.575765
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/content/avs/journal/jvsta/7/4/10.1116/1.575765
1989-07-01
2014-09-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: The preparation of amorphous Si:H thin films for optoelectronic applications by glow discharge dissociation of SiH4 using a direct‐current saddle‐field plasma chamber
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/7/4/10.1116/1.575765
10.1116/1.575765
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