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Fracto‐emission during the interfacial failure of a metal–oxide‐semiconductor system: Au–SiO2–Si
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10.1116/1.576705
/content/avs/journal/jvsta/8/3/10.1116/1.576705
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/8/3/10.1116/1.576705
/content/avs/journal/jvsta/8/3/10.1116/1.576705
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/content/avs/journal/jvsta/8/3/10.1116/1.576705
1990-05-01
2014-08-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fracto‐emission during the interfacial failure of a metal–oxide‐semiconductor system: Au–SiO2–Si
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/8/3/10.1116/1.576705
10.1116/1.576705
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