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Characterization of the interfacial failure of metal thin films on oxidized silicon using fracto‐emission
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10.1116/1.577273
/content/avs/journal/jvsta/9/4/10.1116/1.577273
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/9/4/10.1116/1.577273
/content/avs/journal/jvsta/9/4/10.1116/1.577273
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/content/avs/journal/jvsta/9/4/10.1116/1.577273
1991-07-01
2014-10-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Characterization of the interfacial failure of metal thin films on oxidized silicon using fracto‐emission
http://aip.metastore.ingenta.com/content/avs/journal/jvsta/9/4/10.1116/1.577273
10.1116/1.577273
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