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Real-time process sensing and metrology in amorphous and selective area silicon plasma enhanced chemical vapor deposition using in situ mass spectrometry
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10.1116/1.589237
/content/avs/journal/jvstb/15/1/10.1116/1.589237
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/1/10.1116/1.589237
/content/avs/journal/jvstb/15/1/10.1116/1.589237
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/content/avs/journal/jvstb/15/1/10.1116/1.589237
1997-01-01
2014-12-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Real-time process sensing and metrology in amorphous and selective area silicon plasma enhanced chemical vapor deposition using in situ mass spectrometry
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/1/10.1116/1.589237
10.1116/1.589237
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