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Chemical vapor deposition of TiSi using an industrial integrated cluster tool
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10.1116/1.589238
/content/avs/journal/jvstb/15/1/10.1116/1.589238
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/1/10.1116/1.589238
/content/avs/journal/jvstb/15/1/10.1116/1.589238
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/content/avs/journal/jvstb/15/1/10.1116/1.589238
1997-01-01
2014-12-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Chemical vapor deposition of TiSi2 using an industrial integrated cluster tool
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/1/10.1116/1.589238
10.1116/1.589238
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