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Etching and boron diffusion of high aspect ratio Si trenches for released resonators
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10.1116/1.589276
/content/avs/journal/jvstb/15/2/10.1116/1.589276
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/2/10.1116/1.589276
/content/avs/journal/jvstb/15/2/10.1116/1.589276
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/content/avs/journal/jvstb/15/2/10.1116/1.589276
1997-03-01
2015-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Etching and boron diffusion of high aspect ratio Si trenches for released resonators
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/2/10.1116/1.589276
10.1116/1.589276
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