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Highly anisotropic silicon reactive ion etching for nanofabrication using mixtures of gases
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10.1116/1.589306
/content/avs/journal/jvstb/15/3/10.1116/1.589306
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/3/10.1116/1.589306
/content/avs/journal/jvstb/15/3/10.1116/1.589306
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/content/avs/journal/jvstb/15/3/10.1116/1.589306
1997-05-01
2015-07-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Highly anisotropic silicon reactive ion etching for nanofabrication using mixtures ofSF6/CHF3 gases
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/3/10.1116/1.589306
10.1116/1.589306
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