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Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays
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10.1116/1.589377
/content/avs/journal/jvstb/15/3/10.1116/1.589377
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/3/10.1116/1.589377
/content/avs/journal/jvstb/15/3/10.1116/1.589377
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/content/avs/journal/jvstb/15/3/10.1116/1.589377
1997-05-01
2015-01-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/3/10.1116/1.589377
10.1116/1.589377
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