1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
Integration of unit processes in a shallow trench isolation module for a 0.25 μm complementary metal–oxide semiconductor technology
Rent:
Rent this article for
USD
10.1116/1.589581
/content/avs/journal/jvstb/15/6/10.1116/1.589581
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/6/10.1116/1.589581
/content/avs/journal/jvstb/15/6/10.1116/1.589581
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/avs/journal/jvstb/15/6/10.1116/1.589581
1997-11-01
2015-08-05
Loading

Full text loading...

This is a required field
Please enter a valid email address

Oops! This section does not exist...

Use the links on this page to find existing content.

752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Integration of unit processes in a shallow trench isolation module for a 0.25 μm complementary metal–oxide semiconductor technology
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/6/10.1116/1.589581
10.1116/1.589581
SEARCH_EXPAND_ITEM