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Deep submicron resist profile simulation and characterization of electron beam lithography system for cell projection and direct writing
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10.1116/1.589636
/content/avs/journal/jvstb/15/6/10.1116/1.589636
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/6/10.1116/1.589636
/content/avs/journal/jvstb/15/6/10.1116/1.589636
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/content/avs/journal/jvstb/15/6/10.1116/1.589636
1997-11-01
2014-08-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Deep submicron resist profile simulation and characterization of electron beam lithography system for cell projection and direct writing
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/15/6/10.1116/1.589636
10.1116/1.589636
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