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Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations
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10.1116/1.589837
/content/avs/journal/jvstb/16/1/10.1116/1.589837
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/16/1/10.1116/1.589837
/content/avs/journal/jvstb/16/1/10.1116/1.589837
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/content/avs/journal/jvstb/16/1/10.1116/1.589837
1998-01-01
2014-07-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/16/1/10.1116/1.589837
10.1116/1.589837
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