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Trends in aluminum etch rate uniformity in a commercial inductively coupled plasma etch system
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10.1116/1.590009
/content/avs/journal/jvstb/16/3/10.1116/1.590009
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/16/3/10.1116/1.590009
/content/avs/journal/jvstb/16/3/10.1116/1.590009
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/content/avs/journal/jvstb/16/3/10.1116/1.590009
1998-05-01
2015-02-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Trends in aluminum etch rate uniformity in a commercial inductively coupled plasma etch system
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/16/3/10.1116/1.590009
10.1116/1.590009
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