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Estimation of the activation energy for plasma etching of InP via holes using electron cyclotron resonance
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10.1116/1.590095
/content/avs/journal/jvstb/16/4/10.1116/1.590095
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/16/4/10.1116/1.590095
/content/avs/journal/jvstb/16/4/10.1116/1.590095
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/content/avs/journal/jvstb/16/4/10.1116/1.590095
1998-07-01
2015-04-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Estimation of the activation energy for Ar/Cl2 plasma etching of InP via holes using electron cyclotron resonance
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/16/4/10.1116/1.590095
10.1116/1.590095
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