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Abrupt reduction in poly-Si etch rate in plasma
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10.1116/1.590096
/content/avs/journal/jvstb/16/4/10.1116/1.590096
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/16/4/10.1116/1.590096
/content/avs/journal/jvstb/16/4/10.1116/1.590096
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/content/avs/journal/jvstb/16/4/10.1116/1.590096
1998-07-01
2014-09-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Abrupt reduction in poly-Si etch rate in HBr/O2 plasma
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/16/4/10.1116/1.590096
10.1116/1.590096
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