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Microtrenching resulting from specular reflection during chlorine etching of silicon
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10.1116/1.590135
/content/avs/journal/jvstb/16/4/10.1116/1.590135
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/16/4/10.1116/1.590135
/content/avs/journal/jvstb/16/4/10.1116/1.590135
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/content/avs/journal/jvstb/16/4/10.1116/1.590135
1998-07-01
2014-10-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Microtrenching resulting from specular reflection during chlorine etching of silicon
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/16/4/10.1116/1.590135
10.1116/1.590135
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