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Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography
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10.1116/1.590365
/content/avs/journal/jvstb/16/6/10.1116/1.590365
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/16/6/10.1116/1.590365
/content/avs/journal/jvstb/16/6/10.1116/1.590365
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/content/avs/journal/jvstb/16/6/10.1116/1.590365
1998-11-01
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/16/6/10.1116/1.590365
10.1116/1.590365
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