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Effects of oxygen and fluorine on the dry etch characteristics of organic low-k dielectrics
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10.1116/1.590660
/content/avs/journal/jvstb/17/2/10.1116/1.590660
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/17/2/10.1116/1.590660
/content/avs/journal/jvstb/17/2/10.1116/1.590660
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/content/avs/journal/jvstb/17/2/10.1116/1.590660
1999-03-01
2014-07-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of oxygen and fluorine on the dry etch characteristics of organic low-k dielectrics
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/17/2/10.1116/1.590660
10.1116/1.590660
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