1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Formation and growth of on (001)Si inside 0.2–2 μm oxide openings prepared by electron-beam lithography
Rent:
Rent this article for
USD
10.1116/1.590673
/content/avs/journal/jvstb/17/3/10.1116/1.590673
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/17/3/10.1116/1.590673
/content/avs/journal/jvstb/17/3/10.1116/1.590673
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/avs/journal/jvstb/17/3/10.1116/1.590673
1999-05-01
2014-07-30
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Formation and growth of CoSi2 on (001)Si inside 0.2–2 μm oxide openings prepared by electron-beam lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/17/3/10.1116/1.590673
10.1116/1.590673
SEARCH_EXPAND_ITEM