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Novel process for selective etching using a novel gas source for preventing global warming
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10.1116/1.590676
/content/avs/journal/jvstb/17/3/10.1116/1.590676
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/17/3/10.1116/1.590676
/content/avs/journal/jvstb/17/3/10.1116/1.590676
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/content/avs/journal/jvstb/17/3/10.1116/1.590676
1999-05-01
2015-07-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Novel process for SiO2/Si selective etching using a novel gas source for preventing global warming
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/17/3/10.1116/1.590676
10.1116/1.590676
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