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Two-dimensional dopant profiling of patterned Si wafers using phase imaging tapping mode atomic force microscopy with applied biases
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10.1116/1.590760
/content/avs/journal/jvstb/17/4/10.1116/1.590760
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/17/4/10.1116/1.590760
/content/avs/journal/jvstb/17/4/10.1116/1.590760
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/content/avs/journal/jvstb/17/4/10.1116/1.590760
1999-07-01
2014-09-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Two-dimensional dopant profiling of patterned Si wafers using phase imaging tapping mode atomic force microscopy with applied biases
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/17/4/10.1116/1.590760
10.1116/1.590760
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