1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist
Rent:
Rent this article for
USD
10.1116/1.590976
/content/avs/journal/jvstb/17/6/10.1116/1.590976
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/17/6/10.1116/1.590976
/content/avs/journal/jvstb/17/6/10.1116/1.590976
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/avs/journal/jvstb/17/6/10.1116/1.590976
1999-11-01
2015-03-06
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/17/6/10.1116/1.590976
10.1116/1.590976
SEARCH_EXPAND_ITEM