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Comparative study of Ni nanowires patterned by electron-beam lithography and fabricated by lift-off and dry etching techniques
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10.1116/1.591143
/content/avs/journal/jvstb/18/1/10.1116/1.591143
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/18/1/10.1116/1.591143
/content/avs/journal/jvstb/18/1/10.1116/1.591143
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/content/avs/journal/jvstb/18/1/10.1116/1.591143
2000-01-01
2015-03-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparative study of Ni nanowires patterned by electron-beam lithography and fabricated by lift-off and dry etching techniques
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/18/1/10.1116/1.591143
10.1116/1.591143
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