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Role of the substrate in the C49–C54 transformation of
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10.1116/1.591266
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    Affiliations:
    1 Istituto Nazionale di Metodologie e Tecnologie per la Microelettronica, CNR, I-95121 Catania, Italy
    2 Istituto Nazionale della Fisica per la Materia and Dipartimento di Fisica dell: Università, I-95129 Catania, Italy
    3 Istituto Nazionale della Fisica per la Materia and Dipartimento di Scienza dei Materiali dell’ Università, I-20126 Milano, Italy
    4 Istituto Nazionale della Fisica per la Materia and Dipartimento di Fisica “A. Volta” dell’ Università, I-27100 Pavia, Italy
    5 Istituto Nazionale della Fisica per la Materia and Dipartimento di Fisica dell’ Università, I-67010 L’Aquila, Italy
    J. Vac. Sci. Technol. B 18, 721 (2000); http://dx.doi.org/10.1116/1.591266
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/content/avs/journal/jvstb/18/2/10.1116/1.591266
2000-03-01
2014-09-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Role of the substrate in the C49–C54 transformation of TiSi2
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/18/2/10.1116/1.591266
10.1116/1.591266
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