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Elevated source drain devices using silicon selective epitaxial growth
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10.1116/1.591369
/content/avs/journal/jvstb/18/3/10.1116/1.591369
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/18/3/10.1116/1.591369
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/content/avs/journal/jvstb/18/3/10.1116/1.591369
2000-05-01
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Elevated source drain devices using silicon selective epitaxial growth
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/18/3/10.1116/1.591369
10.1116/1.591369
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