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At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscope
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10.1116/1.1319702
/content/avs/journal/jvstb/18/6/10.1116/1.1319702
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/18/6/10.1116/1.1319702
/content/avs/journal/jvstb/18/6/10.1116/1.1319702
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/content/avs/journal/jvstb/18/6/10.1116/1.1319702
2000-11-01
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscope
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/18/6/10.1116/1.1319702
10.1116/1.1319702
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