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Effects of fluorocarbon polymer deposition on the selective etching of in high density plasma
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10.1116/1.1322046
/content/avs/journal/jvstb/18/6/10.1116/1.1322046
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/18/6/10.1116/1.1322046
/content/avs/journal/jvstb/18/6/10.1116/1.1322046
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/content/avs/journal/jvstb/18/6/10.1116/1.1322046
2000-11-01
2015-05-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of fluorocarbon polymer deposition on the selective etching of SiO2/photoresist in high density plasma
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/18/6/10.1116/1.1322046
10.1116/1.1322046
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