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Erratum: Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse [J. Vac. Sci. Technol. B 18, 3313 (2000)]
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10.1116/1.1358355
/content/avs/journal/jvstb/19/2/10.1116/1.1358355
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/19/2/10.1116/1.1358355
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/content/avs/journal/jvstb/19/2/10.1116/1.1358355
2001-03-01
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Erratum: Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse [J. Vac. Sci. Technol. B 18, 3313 (2000)]
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/19/2/10.1116/1.1358355
10.1116/1.1358355
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