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Modeling and development of a deep silicon etch process for 200 mm election projection lithography mask fabrication
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10.1116/1.1420574
/content/avs/journal/jvstb/19/6/10.1116/1.1420574
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/19/6/10.1116/1.1420574
/content/avs/journal/jvstb/19/6/10.1116/1.1420574
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/content/avs/journal/jvstb/19/6/10.1116/1.1420574
2001-11-01
2015-01-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Modeling and development of a deep silicon etch process for 200 mm election projection lithography mask fabrication
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/19/6/10.1116/1.1420574
10.1116/1.1420574
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